[Paper] In-situ Synchrotron X-ray Scattering Study of Thin Film Growth by Atomic Layer Deposition




In-situ Synchrotron X-ray Scattering Study of Thin Film Growth by Atomic Layer Deposition, Yong Jun Park, Dong Ryeol Lee, Hyun Hwi Lee, Han-Bo-Ram Lee, Hyungjun Kim, Gye-Choon Park, Shi-Woo Rhee, and Sunggi Baik, Journal of Nanoscience and Nanotechnology, 2011


http://dx.doi.org/10.1166/jnn.2011.3399


Abstract


We report an atomic layer deposition chamber for in-situ synchrotron X-ray scattering study of thin film growth. The chamber was designed for combined synchrotron X-ray reflectivity and two- dimensional grazing-incidence X-ray diffraction measurement to do a in-situ monitoring of ALD growth. We demonstrate ruthenium thermal ALD growth for the performance of the chamber. 10, 20, 30, 50, 70, 100, 150 and 250-cycled states are measured by X-ray scattering methods during ALD growth process. Growth rate is calculated from thickness values and the surface roughness of each state is estimated by X-ray reflectivity analysis. The crystal structure of initial growth state is observed by Grazing-incidence X-ray diffraction. These results indicate that in-situ X-ray scattering method is a promising analysis technique to investigate the initial physical morphology of ALD films.