Journal Articles

2017
2016
2015
2014
2013
2012~2006



2017

77. " Conduction mechanism change with transport oxide layer thickness in oxide hetero-interface diode", Bu-il Nam, Jong Seo Park, Keon-Hee Lim, Yong-keon Ahn, Jinwon Lee, Jun-woo Park, Nam-Kwang Cho, Donggun Lee, Han-Bo-Ram Lee, and Youn Sang Kim, App. Phys. Lett, (2017),  doi: http://dx.doi.org/10.1063/1.4996862
76. " Atomic layer deposition of Y-stabilized ZrO2 for advanced DRAM capacitors,Bo-Eun Park, Il-Kwon Oh, Chandreswar Mahata, ChangWan Lee, David Thompson,
Han-Bo-Ram Lee, Wan Joo Maeng, Hyungjun Kim, Journal of Alloys and Compounds,(2017) , Doi : 10.1016/j.jallcom.2017.06.036
75. "Atomic Layer Deposition on 2D Materials," Hyun Gu Kim and Han-Bo-Ram Lee*, Chemistry of Materials,(2017),http://dx.doi.org/10.1021/acs.chemmater.6b05103, [Corresponding author]
74. "Nanoconfined Atomic Layer Deposition of TiO2/Pt Nanotubes: Toward Ultrasmall Highly Efficient Catalytic Nanorockets,” Jinxing Li, Wenjuan Liu, Jiyuan Wang, Isaac Rozen, Sha He, Chuanrui Chen, Hyun Gu Kim, Ha-Jin Lee, Han-Bo-Ram Lee, Se-Hun Kwon, Tianlong Li, Longqiu Li*, Yongfeng Mei*, and Joseph Wang*, Advanced Functional Materials, 1700598 (2017), http://dx.doi.org/10.1002/adfm.201700598, [Co-author]
73. “A Composite Layer of Atomic-Layer-Deposited Al2O3 and Graphene for Flexible Moisture Barrier,” Taewook Nam, Youngju Park, Seung-Woo Seo, Il-Kwon Oh, Jong-Hyun Ahn, Sung Min Cho, Hyungjun Kim*, and Han-Bo-Ram Lee*, Carbon, 116, 553-561 (2017), 2/17/2017, http://dx.doi.org/10.1016/j.carbon.2017.02.023, [Corresponding author]
72. “Atomic Layer Deposition of 1D and 2D Nickel Nanostructures on Graphite,” Seung Wook Ryu† & Jaehong Yoon† & Hyoung-Seok Moon†, Bonggeun Shong, Hyungjun Kim, and Han-Bo-Ram Lee*, Nanotechnology, 28(11), 115301 (2017), 2/13/2017, https://doi.org/10.1088/1361-6528/aa5aec, †Equal contribution, [Corresponding author]
71. “Distribution of Oxygen Functional Groups of Graphene Oxide obtained from Low-temperature Atomic Layer Deposition of Titanium Oxide,” Dong Seok Shin†, Hyun Gu Kim†, Ho Seon Ahn†, Hu Young Jeong, Yeon Jung Kim, Dorj Odkhuu, Han-Bo-Ram Lee* and Byung Hoon Kim*, RSC Advances, 7, 13979-13984 (2017), 3/2/2017, http://dx.doi.org/10.1039/C7RA00114B, [Corresponding author]
70. “Vapor Phase Synthesis of TaS2 Nanocrystals with Iodine as Transport Agent,” Gangtae Jin, Chaeeun Kim, Hyunjin Jo, Se-Hun Kwon, Seong-Jun Jeong, Han-Bo-Ram Lee*, and Ji-Hoon Ahn*, Japanese Journal of Applied Physics, 56, 045501 (2017), 3/3/2017, https://doi.org/10.7567/JJAP.56.045501, [Corresponding author]  
2016

69. “Self-Limiting Layer Synthesis of Transition Metal Dichalcogenides,” Youngjun Kim, Jeong-Gyu Song, Yong Ju Park, Gyeong Hee Ryu, Su Jeong Lee, Jin Sung Kim, Pyo Jin Jeon, Chang Wan Lee, Whang Je Woo, Taejin Choi, Hanearl Jung, Han-Bo-Ram Lee, Jae-Min Myoung, Seongil Im, Zonghoon Lee, Jong-Hyun Ahn, Jusang Park, and Hyungjun Kim*, Scientific Reports, 6, 18754, 1/4/2016, http://dx.doi.org/10.1038/srep18754, [Co-author]
68. “Complementary Unipolar WS2 Field Effect Transistors using Fermi Level De-pinning Layers,” Woojin Park, Yonghun Kim, Ukjin Jung, Jin Ho Yang, Chunhum Cho, Yun Ji Kim, Syed Mohammad Najib Hasan, Hyun Gu Kim, Han-Bo-Ram Lee, and Byoung Hun Lee*, Advanced Electronic Materials, 2(2), 1-5 (2016), 2/12/2016, http://dx.doi.org/10.1002/aelm.201500278, [Co-author]
67. “Growth Characteristics and Electrical Properties of SiO2 Thin Films Prepared using Plasma-Enhanced Atomic Layer Deposition and Chemical Vapor Deposition with an Aminosilane Precursor,” Hanearl Jung, Woo-Hee Kim, Il-Kwon Oh, Chang-Wan Lee, Clement Lansalot-Matras, Su Jeong Lee, Jae-Min Myoung, Han-Bo-Ram Lee, and Hyungjun Kim*, Journal of Materials Science, 51(11), 5082-5091 (2016), 2/22/2016, http://dx.doi.org/10.1007/s10853-016-9811-0, [Co-author]
66. “Wafer-scale, Conformal and Direct Growth of MoS2 Thin Films by Atomic Layer Deposition,” Yujin Jang, Seungmin Yeo, Han-Bo-Ram Lee, Hyungjun Kim, and Soo-Hyun Kim*, Applied Surface Science, 365, 160-165 (2016), 3/1/2016, http://dx.doi.org/10.1016/j.apsusc.2016.01.038, [Co-author]
65. “Growth Mechanism of “Wafer-scale, Conformal and Direct Growth of MoS2 Thin Films by Atomic Layer Deposition,” Yujin Jang, Seungmin Yeo, Han-Bo-Ram Lee, Hyungjun Kim, and Soo-Hyun Kim*, Applied Surface Science, 365, 160-165 (2016), 3/1/2016, http://dx.doi.org/10.1016/j.apsusc.2016.01.038, [Co-author] Co Thin Films
64. “Plasma Enhanced Atomic Layer Deposition of SnO2 Thin Films using SnCl4 Precursor and Oxygen Plasma,” Dong Kwon Lee, Zhixin Wan, Jong-Seong Bae, Han-Bo-Ram Lee, Ji-Hoon Ahn, Sang-Deok Kim, Jayong Kim, and Se-Hun Kwon*, Materials Letters, 166, 163-166 (2016), 3/1/2016, http://dx.doi.org/doi:10.1016/j.matlet.2015.12.049, [Co-author]
63. “Effects of Cl-based Ligand Structures on Atomic Layer Deposited HfO2,” Bo-Eun Park, Il-Kwon Oh, Chang Wan Lee, Gyeongho Lee, Young-Han Shin, Clement Lansalot-Matras, Wontae Noh, Hyungjun Kim*, and Han-Bo-Ram Lee*, Journal of Physical Chemistry C, 120(11), 5958–5967 (2016), 3/11/2016, http://dx.doi.org/10.1021/acs.jpcc.5b05286, [Corresponding author]
62. “Effects of Diffusion Barrier on Cu-gate ZnO:N Thin Film Transistors,” Whang Je Woo, Taewook Nam, Hanearl Jung, Il-Kwon Oh, Han-Bo-Ram Lee, Wanjoo Maeng, and Hyungjun Kim*, IEEE Electron Device Letters, 37(5), 599-602 (2016), 3/31/2016, http://dx.doi.org/10.1109/LED.2016.2549035, [Co-author]
61. ”A Controlled Growth of WNx and WCx Films Prepared by Atomic Layer Deposition,” Jun Beom Kim, Byeong Hyeon Jang, Hyun-Jung Lee, Won Seok Han, Do-Joong Lee, Han-Bo-Ram Lee, Tae Eun Hong, and Soo-Hyun Kim*, Materials Letters, 168, 218-222 (2016), 4/1/2016, http://dx.doi.org/10.1016/j.matlet.2016.01.071, [Co-author]
60. “Comparison of Hydrogen Sulfide Gas and Sulfur Powder for Synthesis of Molybdenum Disulfide Nanosheets,” Jusang Park, Jeonggyu Song, Taejin Choi, Sangwan Sim, Hyunyong Choi, Sang Wook Han, Han-Bo-Ram Lee, Soo-Hyun Kim, and Hyungjun Kim*, Current Applied Physics, http://dx.doi.org/10.1016/j.cap.2016.03.022, 16(7), 691-695 (2016), 4/1/2016, [Co-author]
59. “Highly-conformal Nanocrystalline Molybdenum Nitride Thin Films by Atomic Layer Deposition using a Newly Synthesized Precursor as a Diffusion Barrier against Cu,” Yujin Jang, Jun Beom Kim, Tae Eun Hong, So Jeong Yeo, Sunju Lee, Eun Ae Jung, Bo Keun Park, Taek-Mo Chung, Chang Kim, Do-Joong Lee, Han-Bo-Ram Lee, and Soo-Hyun Kim*, Journal of Alloys and Compounds, 663, 651-658 (2016), 4/5/2016, http://dx.doi.org/10.1016/j.jallcom.2015.12.148, [Co-author]
58. “Formation of Ni Silicide from Atomic Layer Deposited Ni,” Jaehong Yoon, Soo Hyeon Kim, Hangil Kim, Soohyun Kim, Hyungjun Kim*, and Han-Bo-Ram Lee*, Current Applied Physics, 16(7), 720-725 (2016), 4/6/2016, http://dx.doi.org/10.1016/j.cap.2016.04.005, [Corresponding author]
57. “Recent Advances in Atomic Layer Deposition,” Neil P. Dasgupta, Stacey Bent, Paul S. Weiss, and Han-Bo-Ram Lee*, Chemistry of Materials, 28(7), 1943–1947 (2016), 4/12/2016, http://dx.doi.org/10.1021/acs.chemmater.6b00673, [Corresponding author]
56. “A Facile Method for Selective Healing of Graphene Defects Based on a Galvanic Displacement Reaction,” Juree Hong, Jae-Bok Lee, Sanggeun Lee, Jungmok Seo, Hyunsoo Lee, Jeong Young Park, Tae-il Seo, Jong-Hyun Ahn, Taeyoon Lee*, and Han-Bo-Ram Lee*, NPG Asia Materials, 8, e262 (2016), 4/15/2016, http://dx.doi.org/10.1038/am.2016.42, [Corresponding author]
55. “High Efficiency n-Si/p-Cu2O Core–shell Nanowires Photodiode Prepared by Atomic Layer Deposition of Cu2O on Well-ordered Si Nanowires Array,” Hangil Kim, Soo-Hyun Kim*, Kyung Yong Ko, Hyungjun Kim, Jaehoon Kim, Jihun Oh, and Han-Bo-Ram Lee, Electronic Materials Letters, 12(3), 404-410 (2016), 5/10/2016, http://dx.doi.org/10.1007/s13391-016-5356-2, [Co-author]
54. “Very High Frequency Plasma Reactant for Atomic Layer Deposition,” Il-Kwon Oh, Gilsang Yoo, Chang Mo Yoon, Tae Hyung Kim, Geun Young Yeom, Kangsik Kim, Zonghoon Lee, Hanearl Jung, Changwan Lee, Hyungjun Kim* and Han-Bo-Ram Lee*, Applied Surface Science, 387, 109-117 (2016), 6/14/2016, http://dx.doi.org/10.1016/j.apsusc.2016.06.048, [Corresponding author]
53. “Fabrication of 50-nm Scale Nanostructures by Block Copolymer and Its Characteristics of Surface-enhanced Raman Scattering,” Jae Hee Shin, Hyun Gu Kim, Gwang Min Baek, Reehyang Kim, Suwan Jeon, Jeong Ho Mun, Han-Bo-Ram Lee, Yeon Sik Jeong, Sang Ouk Kim, Kyoung Nam Kim, and Geun Young Yeom*, RSC Advance, 6(75), 70756-70762 (2016), 7/26/2016, http://dx.doi.org/10.1039/C6RA08608J, [Co-author]
52. “Uniform Color Coating of Multilayered TiO2/Al2O3 Films by Atomic Layer Deposition,” Woo-Hee Kim, Hyungjun Kim*, and Han-Bo-Ram Lee*, Journal of Coatings Technology and Research, 14(1), 177-183 (2017), 8/29/2016, http://dx.doi.org/10.1007/s11998-016-9840-2, [Corresponding author]
51. “Atomic Layer Deposition of TiN Thin Films for Improving a Corrosion Resistance of Metallic Bipolar Plates,” Eun-Young Yun, Han-Bo-Ram Lee, Suck Won Hong, and Se-Hun Kwon*, submitted to ACS Applied Materials & Interfaces, [Co-author]
50. “Highly Conductive and Flexible Fiber for Textile Electronics Obtained by Extremely Low Temperature Atomic Layer Deposition of Pt,” Jaehong Lee† & Jaehong Yoon†, Hyun Gu Kim, Subin Kang, Woo-Suk Oh, Hassan Algadi, Saleh Al-Sayari, Bonggeun Shong, Soo-Hyun Kim, Hyungjun Kim, Taeyoon Lee*, and Han-Bo-Ram Lee*, NPG Asia Materials, 8, e331 (2016), 11/25/2016, http://dx.doi.org/10.1038/am.2016.182, †Equal contribution, [Corresponding author]
49. Formed by Plasma-enhanced Atomic Layer Deposition using NH3 as Plasma Reactant,” Il-Kwon Oh, Hyungjun Kim*, and Han-Bo-Ram Lee*, Current Applied Physics, 17(3), 333-338 (2016), 12/24/2016, http://dx.doi.org/10.1016/j.cap.2016.12.021, [Corresponding author] 
2015

48. “Plasma Enhanced Atomic Layer Deposition of Co on Metal Surfaces,” Jae-Hong Yoon, Jeong-Gyu Song, Hyungjun Kim*, and Han-Bo-Ram Lee*, Surface and Coating Technology, 264, 60-65 (2015), 1/16/2015, http://dx.doi.org/10.1016/j.surfcoat.2015.01.019, [Corresponding author]
47. “Real-time Detection of Chlorine Gas using Ni/Si Shell/Core Nanowires,” Dong-Jin Lee, Kwang Heo, Hyungwoo Lee, Joon-Hyung Jin, Hochan Chang, Minjun Park, Han-Bo-Ram Lee, Hyungjun Kim, and Byung Yang Lee*, Nanoscale Research Letters, 10(1), 18 (2015), 1/28/2015, http://dx.doi.org/10.1186/s11671-015-0729-2, [Co-author]
46. “One-step Hydrothermal Synthesis of Graphene Decorated V2O5 Nanobelts for Enhanced Electrochemical Energy Storage,” Minoh Lee, Suresh Kannan Balasingam, Hu Young Jeong, Won G. Hong, Han-Bo-Ram Lee, Byung Hoon Kim*, and Yongseok Jun*, Scientific Reports, 5, 8151 (2015), 1/30/2015, http://dx.doi.org/10.1038/srep08151 [Co-author]
45. “Internal and External Atomic Steps in Graphite Exhibit Dramatically Different Physical and Chemical Properties,“ Hyunsoo Lee, Han-Bo-Ram Lee, Sangku Kwon, Miquel Salmeron, and Jeong Young Park*, ACS Nano, 9(4), 3814-3819 (2015), 3/27/2015, http://dx.doi.org/10.1021/nn506755p [Co-author]
44. “Influence of in situ Surface Cleaning on a Ge Substrate using TMA and MgCp2 for HfO2-based Gate Oxides”, Il-Kwon Oh, Kangsik Kim, Zonghoon Lee, Jeong-Gyu Song, Chang- Wan Lee, David Thompson, Han-Bo-Ram Lee, Woo-Hee Kim, Wan Joo Maeng and Hyungjun Kim*, Journal of Materials Chemistry C, 3, 4852-4858 (2015), 4/22/2015, http://dx.doi.org/10.1039/C4TC02686A [Co-author]
43. “Reversible Liquid Adhesion Switching of Superamphiphobic Pd-decorated Ag dendrites via Gas-induced Structural Changes,” Dayeong Kim, Jungmok Seo, Soonil Lee, Sera Shin, Hyeonjin Cho, Han-Bo-Ram Lee, and Taeyoon Lee*, Chemistry of Materials, 27 (14), 4964-4971 (2015), 6/30/2015, http://dx.doi.org/10.1021/acs.chemmater.5b01038, [Co-author]
42.“Nucleation and Growth of an HfO2 Dielectric Layer for Graphene-Based Devices,” Il-Kwon Oh, Jukka Tanskanen, Hanearl Jung, Kangsik Kim, Mi Jin Lee, Zonghoon Lee, Seung-Ki Lee, Jong-Hyun Ahn, Changwan Lee, Kwanpyo Kim, Hyungjun Kim*, and Han-Bo-Ram Lee*, Chemistry of Materials, 27 (17), 5868–5877 (2015), 8/19/2015, http://dx.doi.org/10.1021/acs.chemmater.5b01226, [Corresponding author]
41. “Formation of Continuous Pt Films on the Graphite Surface by Atomic Layer Deposition with Reactive O3,” Han-Bo-Ram Lee and Stacey F. Bent*, Chemistry of Materials, 27(19), 6802–6809 (2015), 10/1/2015, http://dx.doi.org/10.1021/acs.chemmater.5b03076, [First author]
40. “Area-Selective Chemical Vapor Deposition of Co for Cu Capping Layer,” by Seung Wook Ryu, Soo Hyeon Kim, Jaehong Yoon, Jukka T. Tanskanen, Hyungjun Kim*, and Han-Bo-Ram Lee*, Current Applied Physics, 16(1), 88–92 (2016), 10/30/2015, http://dx.doi.org/10.1016/j.cap.2015.10.013, [Corresponding author]
39. “Improved Corrosion Resistance and Mechanical Properties of CrN Hard Coatings with Atomic Layer Deposited Al2O3 Interlayer,” Zhixin Wan, Teng Fei Zhang, Han-Bo-Ram Lee, Ji Hoon Yang, Woo Chang Choi, Byungchan Han, Kwang Ho Kim*, and Se-Hun Kwon*, ACS Applied Materials & Interfaces, 7(48), 26716-26725 (2015), 11/23/2015, http://dx.doi.org/10.1021/acsami.5b08696, [Co-author] 
2014

38. “The Effect of O3 on Growth of Pt by Atomic Layer Deposition,” Han-Bo-Ram Lee, Katie L. Pickrahn, and Stacey F. Bent*, Journal of Physical Chemistry C, 118(23), 12325-12332 (2014), 6/2/2014, http://www.dx.doi.org/10.1021/jp502596n, [First author]
37. “Selective Metal Deposition at Graphene Line Defects by Atomic Layer Deposition,” Kwanpyo Kim† & Han-Bo-Ram Lee†, Richard W. Johnson, Jukka T. Tanskanen, Nan Liu, Myung-Gil Kim, Changhyun Pang, Chiyui Ahn, Stacey F. Bent, and Zhenan Bao*, Nature Communications, 5, 4781 (2014), 9/2/2014, http://www.dx.doi.org/10.1038/ncomms5781, †Equal contribution, [First author]
36. “Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition,” Il-Kwon Oh, Kang-Sik Kim, Zonghoon Lee, Kyung-Yong Ko, Su Jeong Lee, Jae-Min Myung, Clement Lansalot-Matras, Wontae Noh, Hyungjun Kim*, and Han-Bo-Ram Lee*, Chemistry of Materials, 27(1), 148-156 (2014), 12/19/2014, http://www.dx.doi.org/10.1021/cm503659d, [Corresponding author] 
2013

35. “The Study of Ru Nanodot Synthesis using a CO2 Supercritical Fluid Deposition,” Doyoung Kim, Han-Bo-Ram Lee, Jaehong Yoon, and Hyungjun Kim*, Journal of Physics and Chemistry of Solids, 74(5), 664-667 (2013), 1/5/2013, http://dx.doi.org/10.1016/j.jpcs.2012.12.022, [Co-author]
34. “Growth of Pt Nanowires by Atomic Layer Deposition on Highly Ordered Pyrolytic Graphite,” Han-Bo-Ram Lee, Sung-Hyeon Baeck, Thomas F. Jaramillo, and Stacey F. Bent*, Nano Letters, 13(2), 457-463 (2013), 1/14/2013, http://dx.doi.org/10.1021/nl303803p, [First author]
33. “Flexible Wireless Temperature Sensors Based on Ni Microparticle-Filled Binary Polymer Composites,” Jin Jeon, Han-Bo-Ram Lee, and Zhenan Bao*, Advanced Materials, 25(6), 850-855 (2013), 2/13/13, http://dx.doi.org/10.1002/adma.201204082, [Co-author]
32. “Highly Sensitive, Patternable Organic Films at the Nanoscale Made by Bottom-up Assembly,” Han Zhou, James M. Blackwell, Han-Bo-Ram Lee, and Stacey F. Bent*, ACS Applied Materials and Interfaces, 5(9), 3691-3696 (2013), 4/17/2013, http://dx.doi.org/10.1021/am4002887, [Co-author]
31. “Plasma-enhanced Atomic Layer Deposition of Co using Co(MeCp)2 Precursor”, Jusang Park, Han-Bo-Ram Lee, Doyoung Kim, Jaehong Yoon, Clement Lansalot, Julien Gatineau, Henri Chevrel, and Hyungjun Kim*, Journal of Energy Chemistry, 22(3), 403-407 (2013), 5/1/2013, http://dx.doi.org/10.1016/S2095-4956(13)60052-2, [Co-author]
30. “Self-assembly Based Plasmonic Arrays Tuned by Atomic Layer Deposition for Extremely Concentrated Visible Light Absorption,” Carl Hägglund, Gabriel Zeltzer, Ricardo Ruiz, Isabell Thomann, Han-Bo-Ram Lee, Mark L. Brongersma, and Stacey F. Bent*, Nano Letters, 13(7), 3352-3357 (2013), 6/27/2013, http://dx.doi.org/10.1021/nl401641v, [Co-author]
29. “Vapor Transport Deposition and Epitaxy of Orthorhombic SnS on Glass and NaCl Substrates”, Artit Wangperawong, Steven M. Herron, Rory R. Runser, Carl Hägglund, Jukka Tanskanen, Han-Bo-Ram Lee, Bruce M. Clemens, and Stacey F. Bent*, Applied Physics Letters, 103, 052105 (2013), 7/30/2013, http://dx.doi.org/10.1063/1.4816746, [Co-author] 
2012

28. “Silicidation of Co/Si Core Shell Nanowires,” Han-Bo-Ram Lee, Gil Ho Gu, Chan Gyung Park, and Hyungjun Kim*, Journal of The Electrochemical Society, 159, K146-K151 (2012), 03/02/12, http://dx.doi.org/10.1149/2.078205jes, [First author]
27. “Initial Stage Growth during Plasma Enhanced Atomic Layer Deposition of Cobalt,” Han-Bo-Ram Lee, Yong Jun Park, Sunggi Baik, and Hyungjun Kim*, Chemical Vapor Deposition, 18, 41-45 (2012), 03/05/12, http://dx.doi.org/10.1002/cvde.201106937, [First author]
26. “Active MnOx Electrocatalysts Prepared by Atomic Layer Deposition for the Oxygen Evolution and Oxygen Reduction Reactions,” Katie L. Pickrahn, Sang Wook Park, Yelena Gorlin, Han-Bo-Ram Lee, Thomas F. Jaramillo, and Stacey F. Bent*, Advanced Energy Materials, 2, 1269-1277 (2012), 06/14/12, http://dx.doi.org/10.1002/aenm.201200230, [Co-author]
25. “The Low Temperature Atomic Layer Deposition of Ruthenium and the Effect of Oxygen Exposure,” Rungthiwa Methaapanon, Scott M. Geyer, Han-Bo-Ram Lee, and Stacey F. Bent*, Journal of Materials Chemistry, 22, 25154-25156 (2012), 10/01/2012, http://dx.doi.org/10.1039/C2JM35332F, [Co-author]
24. “Nucleation-controlled Growth of Nanoparticles by Atomic Layer Deposition,” Han-Bo-Ram Lee, Marja N. Mullings, Xirong Jiang, Bruce M. Clemens and Stacey F. Bent*, Chemistry of Materials, 24, 4051-4059 (2012), 10/19/2012, http://dx.doi.org/10.1021/cm3014978, [First author] 
2011

23. “Effects of Self-Assembled Monolayers on Solid- State CdS Quantum Dot Sensitized Solar Cells,” Pendar Ardalan, Thomas P. Brennan, Han-Bo-Ram Lee, Jonathan R. Bakke, I-Kang Ding, Michael D. McGehee, Stacey F. Bent*, ACS Nano, 5, 1495-1504 (2011), 02/07/11, http://dx.doi.org/10.1021/nn103371v, [Co-author]
22. “In-situ Synchrotron X-ray Scattering Study of Thin Film Growth by Atomic Layer Deposition,” Yong Jun Park, Dong Ryeol Lee, Hyun Hwi Lee, Han-Bo-Ram Lee, Hyungjun Kim, Gye-Choon Park, Shi-Woo Rhee, and Sunggi Baik*, Journal of Nanoscience and Nanotechnology, 11, 1577-1580 (2011), 02/01/11, http://dx.doi.org/10.1166/jnn.2011.3399, [Co-author]
21. “Atomic Layer Deposition of CdS Quantum Dots for Solid-State Quantum Dot Sensitized Solar Cells,” Thomas P. Brennan, Pendar Ardalan, Han-Bo-Ram Lee, Jonathan R. Bakke, I-Kang Ding, Michael D. McGehee, Stacey F. Bent*, Advanced Energy Materials, 1, 1169-1175 (2011), 10/04/11, http://dx.doi.org/10.1002/aenm.201100363, [Co-author]
20. “Atomic Layer Deposition of Co using N2/H2 Plasma as a Reactant,” Jaehong Yoon, Han-Bo-Ram Lee, Doyoung Kim, Taehoon Cheon, Soo-Hyun Kim, and Hyungjun Kim*, Journal of The Electrochemical Society, 158, H1179-H1182 (2011), 10/05/11, http://dx.doi.org/10.1149/2.077111jes, [Co-author]
19. “Supercritical Fluid Deposition of SiO2 Thin Films: Growth Characteristics and Film Properties,” Han-Bo-Ram Lee, In Chan Hwang, Jae-Min Kim, and Hyungjun Kim*, Journal of The Electrochemical Society, 159, D46-D49 (2011), 12/15/11, http://dx.doi.org/10.1149/2.031202jes, [First author]
18. “Microstructure-Dependent Nucleation in Atomic Layer Deposition of Pt on TiO2,” Han-Bo-Ram Lee and Stacey F. Bent*, Chemistry of Materials, 24, 279-286 (2011), 12/29/11, http://dx.doi.org/10.1021/cm202764b, [First author] 
2010

17. “Self-formation of Dielectric Layer Containing CoSi2 Nanocrystals by Plasma-Enhanced Atomic Layer Deposition,” Han-Bo-Ram Lee and Hyungjun Kim*, Journal of Crystal Growth, 312, 2215-2219 (2010), 05/05/10, http://dx.doi.org/10.1016/j.jcrysgro.2010.04.048, [First author]
16. “Plasma-Enhanced Atomic Layer Deposition of Ni,” Han-Bo-Ram Lee, Sung-Hwan Bang, Woo-Hee Kim, Gil Ho Gu, Young Kuk Lee, Taek-Mo Chung, Chang Gyoun Kim, C. G. Park, and Hyungjun Kim, Japanese Journal of Applied Physics, 49, 05FA11 (2010), 05/20/10, http://dx.doi.org/10.1143/JJAP.49.05FA11, [First author]
15. “Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor,” Jae-Min Kim, Han-Bo-Ram Lee, Clement Lansalot, Christian Dussarrat, Julien Gatineau, and Hyungjun Kim*, Japanese Journal of Applied Physics, 49, 05FA10 (2010), 05/20/10, http://dx.doi.org/10.1143/JJAP.49.05FA10, [Co-author]
14. “Deposition of Ultra-Thin Polythiourea Films by Molecular Layer Deposition,” Paul W. Loscutoff, Han-Bo-Ram Lee, and Stacey F. Bent*, Chemistry of Materials, 22, 5563 -5569 (2010), 09/08/10, http://dx.doi.org/10.1021/cm1016239, [Co-author]
13. “Area Selective Atomic Layer Deposition by Microcontact Printing with a Water-Soluble Polymer,” Marja N. Mullings, Han-Bo-Ram Lee, Nathan Marchack, Xirong Jiang, Zhebo Chen, Yelena Gorlin, Kuang-Po Lin, and Stacey F. Bent*, Journal of The Electrochemical Society, 157, D600-D604 (2010), 10/04/10, http://dx.doi.org/10.1149/1.3491376, [Co-author]
12. “High Quality Area-Selective Atomic Layer Deposition Co using Ammonia Gas as a Reactant,” Han-Bo-Ram Lee, Woo-Hee Kim, Jeong Won Lee, Kwang Heo, In Chan Hwang, Yongjun Park, Seunghun Hong, and Hyungjun Kim*, Journal of The Electrochemical Society, 157, D10-D15 (2010), 11/03/09, http://dx.doi.org/10.1149/1.3248002, [First author]
11. “Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective Deposition,” Woo-Hee Kim, Han-Bo-Ram Lee, Kwang Heo, Young Kuk Lee, Taek-Mo Chung, Chang Gyoun Kim, Seunghun Hong, Jong Heo, and Hyungjun Kim*, Journal of The Electrochemical Society, 158, D1-D5 (2011), 11/09/10, http://dx.doi.org/10.1149/1.3504196, [Co-author]
10. “Degradation of Deposition Blocking Layer during Area Selective Plasma Enhanced Atomic Layer Deposition of Cobalt,” Han-Bo-Ram Lee, Woo-Hee Kim, Jeong Won Lee, Jaemin Kim, Inchan Hwang, and Hyungjun Kim*, Journal of Korean Physical Society, 56, 104-107 (2010), 12/01/09, http://dx.doi.org/10.3938/jkps.56.104, [First author] 
2009

9. (Review Article) “Applications of Atomic Layer Deposition to Nanofabrication and Emerging Nanodevices,” Hyungjun Kim*, Han-Bo-Ram Lee, and W.-J. Maeng, Thin Solid Films, 517, 2563-2580 (2009), 02/27/09, http://dx.doi.org/10.1016/j.tsf.2008.09.007, [Co-author]
8. “The Supercritical Fluid Deposition of Conformal SrTiO3 Films with Composition Uniformity in Nano-contact Holes,” J. H. Lee, J. Y. Son, Han-Bo-Ram Lee, Heung-Soon Lee, D.-J. Ma, C.-S. Lee, and Hyungjun Kim*, Electrochemical and Solid State Letters, 12, D45-D47 (2009), 03/06/09, http://dx.doi.org/10.1149/1.3092891, [Co-author] 
2008

7. “Spontaneous Formation of Vertical Magnetic Metal Nanorod Arrays during Plasma Enhanced Atomic Layer Deposition,” Han-Bo-Ram Lee, Gil Ho Gu, J. Y. Son, C.G. Park, and Hyungjun Kim*, Small, 4, 2247-2254 (2008), 10/30/08, http://dx.doi.org/10.1002/smll.200801074, [First author]

2007

6. “Thermal and Plasma Enhanced Atomic Layer Deposition Ruthenium and Electrical Characterization as a Metal Electrode,” Sang-Joon Park , Woo-Hee Kim, Han-Bo-Ram Lee, W. J. Maeng, and Hyungjun Kim*, Microelectronic Engineering, 85, 39-44 (2008), 02/12/07, http://dx.doi.org/10.1016/j.mee.2007.01.239, [Co-author]
5. “Nitride Mediated Epitaxy of CoSi2 Through Self-interlayer-formation of Plasma-Enhanced Atomic Layer Deposition Co,” Han-Bo-Ram Lee, J. Y. Son and Hyungjun Kim*, Applied Physics Letters, 90, 123509 (2007), 03/23/07, http://dx.doi.org/10.1063/1.2742791, [First author]
4. “Stress Dependence of Growth Mode Change of Epitaxial Layered Cobaltite γ-Na0.7CoO2,” J. Y. Son, Han-Bo-Ram Lee, and J. H. Cho*, Applied Surface Science, 254, 436-440 (2007), 06/06/07, http://dx.doi.org/10.1016/j.apsusc.2007.05.074, [Co-author]
3. “Surface Charge on Ferroelectric Thin Film by The High Electric Field Induced at Scanning Probe Microscope Tip,” J. Y. Son, Young-Han Shin, Han-Bo-Ram Lee, Hyungjun Kim, J. H. Cho*, and A. I. Ali*, Journal of Korean Physical Society, 51, S125-S128 (2007), 10/31/07, http://dx.doi.org/10.3938/jkps.51.125, [Co-author]
2. “High Quality Epitaxial CoSi2 using Plasma Nitridation-Mediated Epitaxy; The Effects of Capping Layer,” Han-Bo-Ram Lee, Gil Ho Gu, J.Y. Son, C.G. Park, and Hyungjun Kim*, Journal of Applied Physics, 102, 094509 (2007), 11/08/07, http://dx.doi.org/10.1063/1.2805649, [First author]

2006

1. “High Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition,” Han-Bo-Ram Lee and Hyungjun Kim*, Electrochemical and Solid State Letters, 9, G323-G325 (2006), 08/29/06, http://dx.doi.org/10.1149/1.2338777, [First author]


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